Volta Data Centres has been successfully accredited for ISO 9001:2008, ISO 14001:2004, OHSAS 18001:2007 and PAS 99:2012. These accreditations, completed in under nine months, demonstrate Volta’s commitment to providing the highest standards in quality, environment, health & safety, and management systems for their customers and partners.
The ISO accreditations were awarded by the Direct Assessment Services (DAS) on behalf of the United Kingdom Accreditation Service (UKAS). DAS is an organisation accredited by UKAS demonstrating competence, impartiality and reliability in its ability to deliver results. Accreditation ensures that everyone from specifiers, purchasers, and suppliers to consumers can have confidence in the quality of goods and in the provision of services throughout the supply chain. UKAS is the sole national accreditation body recognised by the British government to assess the competence of organisations that provide certification, testing, inspection, and calibration services.
In order to obtain accreditation, Volta established a complete integrated management system in which policy, process, and procedures were created to ensure functions such as quality and emergency preparedness through to legal compliance items were identified, assessed and reviewed.
Matthew Dent, CEO of Volta commented, “The ISO accreditations underline our commitment to the highest levels of standards for our customers. Not only does our Great Sutton Street data centre offer resilience, scalability and connectivity in the centre of a world-class city like London, our customers can be reassured that we are rigorously operating at first-class standards as well.”
Dent continued, “Successfully obtaining these ISO accreditations in such a short period of time is a testimony to the fact that we are a serious player in the market. Volta ensures that not only the engineering and operational aspects are delivered with exceptional quality, but on time and best in practice, constantly exceeding our customers’ expectations as well as affirming the resilience of our collocation facilities.”
